SUBSTRATE PROCESSING APPARATUS, PURGE GAS CONTROL METHOD, AND VACUUM TRANSFER CHAMBER CLEANING METHOD

A substrate processing apparatus is disclosed. The apparatus comprises a vacuum transfer chamber including a top surface, a bottom surface, and side surfaces between the top and the bottom surfaces, including a first side surface and a second side surface opposite to the first side surface; a transf...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAKAHASHI, Eiji, NANASAKI, Genichi, KITA, Masatomo, OSADA, Hideyuki, AMIKURA, Norihiko, KAISE, Seiichi, TAKIZAWA, Takashi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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