PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS
A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensio...
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creator | CORTIE, Rogier Hendrikus Magdalena SCHELLENS, Hendrikus Johannes GOSEN, Jeroen Gerard HEEREN, Adrianus Marinus Wouter CUYPERS, Koen SRIVASTAVA, Sudhir LENSSEN, Bo EUMMELEN, Erik Henricus Egidius Catharina JANSSENS, Stef Marten Johan RENCKENS, Theodorus Johannes Antonius |
description | A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member. |
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APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; BLASTING ; CINEMATOGRAPHY ; COCKS ; DEVICES FOR VENTING OR AERATING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; HOLOGRAPHY ; LIGHTING ; MATERIALS THEREFOR ; MECHANICAL ENGINEERING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TAPS ; THERMAL INSULATION IN GENERAL ; VALVES ; WEAPONS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220310&DB=EPODOC&CC=US&NR=2022075264A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220310&DB=EPODOC&CC=US&NR=2022075264A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CORTIE, Rogier Hendrikus Magdalena</creatorcontrib><creatorcontrib>SCHELLENS, Hendrikus Johannes</creatorcontrib><creatorcontrib>GOSEN, Jeroen Gerard</creatorcontrib><creatorcontrib>HEEREN, Adrianus Marinus Wouter</creatorcontrib><creatorcontrib>CUYPERS, Koen</creatorcontrib><creatorcontrib>SRIVASTAVA, Sudhir</creatorcontrib><creatorcontrib>LENSSEN, Bo</creatorcontrib><creatorcontrib>EUMMELEN, Erik Henricus Egidius Catharina</creatorcontrib><creatorcontrib>JANSSENS, Stef Marten Johan</creatorcontrib><creatorcontrib>RENCKENS, Theodorus Johannes Antonius</creatorcontrib><title>PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS</title><description>A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.</description><subject>ACTUATING-FLOATS</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CINEMATOGRAPHY</subject><subject>COCKS</subject><subject>DEVICES FOR VENTING OR AERATING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>HOLOGRAPHY</subject><subject>LIGHTING</subject><subject>MATERIALS THEREFOR</subject><subject>MECHANICAL ENGINEERING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TAPS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>VALVES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyz0LwjAUheEsDqL-hwuuCjV-zZc0aQIhCTdJ11IkDiJaqP8fKzg6OJ3hfc6c3QLJGDNJEN4l8hZatK3cAIKy2dSg0dXWuAZioizSRypPYE3SviEM2gjAEJAw5QgTnp6_45LNrv19LKvvLthayST0tgzProxDfymP8upy5BXn1fnITwfc7f9Tb4LNN0k</recordid><startdate>20220310</startdate><enddate>20220310</enddate><creator>CORTIE, Rogier Hendrikus Magdalena</creator><creator>SCHELLENS, Hendrikus Johannes</creator><creator>GOSEN, Jeroen Gerard</creator><creator>HEEREN, Adrianus Marinus Wouter</creator><creator>CUYPERS, Koen</creator><creator>SRIVASTAVA, Sudhir</creator><creator>LENSSEN, Bo</creator><creator>EUMMELEN, Erik Henricus Egidius Catharina</creator><creator>JANSSENS, Stef Marten Johan</creator><creator>RENCKENS, Theodorus Johannes Antonius</creator><scope>EVB</scope></search><sort><creationdate>20220310</creationdate><title>PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS</title><author>CORTIE, Rogier Hendrikus Magdalena ; SCHELLENS, Hendrikus Johannes ; GOSEN, Jeroen Gerard ; HEEREN, Adrianus Marinus Wouter ; CUYPERS, Koen ; SRIVASTAVA, Sudhir ; LENSSEN, Bo ; EUMMELEN, Erik Henricus Egidius Catharina ; JANSSENS, Stef Marten Johan ; RENCKENS, Theodorus Johannes Antonius</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022075264A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>ACTUATING-FLOATS</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CINEMATOGRAPHY</topic><topic>COCKS</topic><topic>DEVICES FOR VENTING OR AERATING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>HOLOGRAPHY</topic><topic>LIGHTING</topic><topic>MATERIALS THEREFOR</topic><topic>MECHANICAL ENGINEERING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TAPS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>VALVES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>CORTIE, Rogier Hendrikus Magdalena</creatorcontrib><creatorcontrib>SCHELLENS, Hendrikus Johannes</creatorcontrib><creatorcontrib>GOSEN, Jeroen Gerard</creatorcontrib><creatorcontrib>HEEREN, Adrianus Marinus Wouter</creatorcontrib><creatorcontrib>CUYPERS, Koen</creatorcontrib><creatorcontrib>SRIVASTAVA, Sudhir</creatorcontrib><creatorcontrib>LENSSEN, Bo</creatorcontrib><creatorcontrib>EUMMELEN, Erik Henricus Egidius Catharina</creatorcontrib><creatorcontrib>JANSSENS, Stef Marten Johan</creatorcontrib><creatorcontrib>RENCKENS, Theodorus Johannes Antonius</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CORTIE, Rogier Hendrikus Magdalena</au><au>SCHELLENS, Hendrikus Johannes</au><au>GOSEN, Jeroen Gerard</au><au>HEEREN, Adrianus Marinus Wouter</au><au>CUYPERS, Koen</au><au>SRIVASTAVA, Sudhir</au><au>LENSSEN, Bo</au><au>EUMMELEN, Erik Henricus Egidius Catharina</au><au>JANSSENS, Stef Marten Johan</au><au>RENCKENS, Theodorus Johannes Antonius</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS</title><date>2022-03-10</date><risdate>2022</risdate><abstract>A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ACTUATING-FLOATS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS BLASTING CINEMATOGRAPHY COCKS DEVICES FOR VENTING OR AERATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS |
title | PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS |
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