RF TREATMENT SYSTEMS AND METHODS
Methods and systems are provided for applying RF power as part of an RF treatment. Starting the RF treatment may include treating a product positioned within an RF chamber with RF waves. The RF treatment may include estimating a log kill of the product during the RF treatment and terminating the RF...
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| creator | Kabir, Zakiul Chun, PhD, Hon Ming Yaghmaee, PhD, Parastoo Smalley, Nathanial G |
| description | Methods and systems are provided for applying RF power as part of an RF treatment. Starting the RF treatment may include treating a product positioned within an RF chamber with RF waves. The RF treatment may include estimating a log kill of the product during the RF treatment and terminating the RF treatment responsive to the estimated log kill reaching a log kill threshold. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2022057138A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2022057138A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2022057138A13</originalsourceid><addsrcrecordid>eNrjZFAIclMICXJ1DPF19QtRCI4MDnH1DVZw9HNR8HUN8fB3CeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGRkYGpuaGxhaOhsbEqQIAg94i4g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>RF TREATMENT SYSTEMS AND METHODS</title><source>esp@cenet</source><creator>Kabir, Zakiul ; Chun, PhD, Hon Ming ; Yaghmaee, PhD, Parastoo ; Smalley, Nathanial G</creator><creatorcontrib>Kabir, Zakiul ; Chun, PhD, Hon Ming ; Yaghmaee, PhD, Parastoo ; Smalley, Nathanial G</creatorcontrib><description>Methods and systems are provided for applying RF power as part of an RF treatment. Starting the RF treatment may include treating a product positioned within an RF chamber with RF waves. The RF treatment may include estimating a log kill of the product during the RF treatment and terminating the RF treatment responsive to the estimated log kill reaching a log kill threshold.</description><language>eng</language><subject>BLASTING ; DRYING ; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; WEAPONS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220224&DB=EPODOC&CC=US&NR=2022057138A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220224&DB=EPODOC&CC=US&NR=2022057138A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Kabir, Zakiul</creatorcontrib><creatorcontrib>Chun, PhD, Hon Ming</creatorcontrib><creatorcontrib>Yaghmaee, PhD, Parastoo</creatorcontrib><creatorcontrib>Smalley, Nathanial G</creatorcontrib><title>RF TREATMENT SYSTEMS AND METHODS</title><description>Methods and systems are provided for applying RF power as part of an RF treatment. Starting the RF treatment may include treating a product positioned within an RF chamber with RF waves. The RF treatment may include estimating a log kill of the product during the RF treatment and terminating the RF treatment responsive to the estimated log kill reaching a log kill threshold.</description><subject>BLASTING</subject><subject>DRYING</subject><subject>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAIclMICXJ1DPF19QtRCI4MDnH1DVZw9HNR8HUN8fB3CeZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGRkYGpuaGxhaOhsbEqQIAg94i4g</recordid><startdate>20220224</startdate><enddate>20220224</enddate><creator>Kabir, Zakiul</creator><creator>Chun, PhD, Hon Ming</creator><creator>Yaghmaee, PhD, Parastoo</creator><creator>Smalley, Nathanial G</creator><scope>EVB</scope></search><sort><creationdate>20220224</creationdate><title>RF TREATMENT SYSTEMS AND METHODS</title><author>Kabir, Zakiul ; Chun, PhD, Hon Ming ; Yaghmaee, PhD, Parastoo ; Smalley, Nathanial G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022057138A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>BLASTING</topic><topic>DRYING</topic><topic>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>Kabir, Zakiul</creatorcontrib><creatorcontrib>Chun, PhD, Hon Ming</creatorcontrib><creatorcontrib>Yaghmaee, PhD, Parastoo</creatorcontrib><creatorcontrib>Smalley, Nathanial G</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kabir, Zakiul</au><au>Chun, PhD, Hon Ming</au><au>Yaghmaee, PhD, Parastoo</au><au>Smalley, Nathanial G</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RF TREATMENT SYSTEMS AND METHODS</title><date>2022-02-24</date><risdate>2022</risdate><abstract>Methods and systems are provided for applying RF power as part of an RF treatment. Starting the RF treatment may include treating a product positioned within an RF chamber with RF waves. The RF treatment may include estimating a log kill of the product during the RF treatment and terminating the RF treatment responsive to the estimated log kill reaching a log kill threshold.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING WEAPONS |
| title | RF TREATMENT SYSTEMS AND METHODS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T17%3A28%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Kabir,%20Zakiul&rft.date=2022-02-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2022057138A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |