OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS

A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fi...

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Hauptverfasser: TSIROGIANNIS, Georgios, GKOROU, Dimitra, SPIERING, Frans Reinier, ROY, Sarathi, VAN WIJK, Robert Jan, GROUWSTRA, Cédric Désiré, NIJE, Jelle, CHEN, Tzu-Chao, YPMA, Alexander
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creator TSIROGIANNIS, Georgios
GKOROU, Dimitra
SPIERING, Frans Reinier
ROY, Sarathi
VAN WIJK, Robert Jan
GROUWSTRA, Cédric Désiré
NIJE, Jelle
CHEN, Tzu-Chao
YPMA, Alexander
description A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS
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