METHODS FOR OPTICAL PROXIMITY CORRECTION AND METHODS OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

A semiconductor device fabrication method includes providing a layout; performing an optical proximity correction on the layout to generate a corrected layout; and forming a photoresist pattern on a substrate by using a photomask fabricated with the corrected layout. The OPC may include: extracting...

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Bibliographische Detailangaben

1. Verfasser:	Yeo, Sang Chul
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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