A STAIN-RESISTANT POLYAMIDE COMPOSITION

Present application disclosed a stain-resistant polyamide composition comprising, a) 55-80 wt. % of semi-crystalline semi-aromatic polyamide; b) 5-15 wt. % of aliphatic polyamide; c) 15-30 wt. % of amorphous semi-aromatic polyamide; wherein the weight percentages of a), b) and c) are relative to the...

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Bibliographische Detailangaben
Hauptverfasser:	ZHENG, Lidong, LIAO, Ruogu, LIU, Xin
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Present application disclosed a stain-resistant polyamide composition comprising, a) 55-80 wt. % of semi-crystalline semi-aromatic polyamide; b) 5-15 wt. % of aliphatic polyamide; c) 15-30 wt. % of amorphous semi-aromatic polyamide; wherein the weight percentages of a), b) and c) are relative to the total weight of a), b) and c) and the sum of the weight percentages of a), b) and c) is 100 wt. %; and wherein the semi-crystalline semi-aromatic polyamide comprises repeat units derived from condensation of terephthalic acid and at least one aliphatic diamine having more than 8 and less than 12 carbon atoms.