METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY
A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structu...
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| creator | DUVDEVANI-BAR, Sharon YOSHIZAWA, Taku SAHA, Kasturi NOIFELD, Efrat VERESCHAGIN, Vadim KLEBANOV, Grigory MIROKU, Hiroshi SCHWARZBAND, Ishai KRIS, Roman MEIR, Roi LEVIN, Sahar LEVI, Shimon |
| description | A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2021383529A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2021383529A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2021383529A13</originalsourceid><addsrcrecordid>eNrjZHD3dQ3x8HfRUQiODA5x9VVw9HNRcPb3DQgNcQ1SCAjydw9y9AXRLqHOIQpu_kEKxi66fmBFLsFA5UDdQf4-_u6RPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPjTYyMDI0NjC2NTI0tHQmDhVAH_oLW8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY</title><source>esp@cenet</source><creator>DUVDEVANI-BAR, Sharon ; YOSHIZAWA, Taku ; SAHA, Kasturi ; NOIFELD, Efrat ; VERESCHAGIN, Vadim ; KLEBANOV, Grigory ; MIROKU, Hiroshi ; SCHWARZBAND, Ishai ; KRIS, Roman ; MEIR, Roi ; LEVIN, Sahar ; LEVI, Shimon</creator><creatorcontrib>DUVDEVANI-BAR, Sharon ; YOSHIZAWA, Taku ; SAHA, Kasturi ; NOIFELD, Efrat ; VERESCHAGIN, Vadim ; KLEBANOV, Grigory ; MIROKU, Hiroshi ; SCHWARZBAND, Ishai ; KRIS, Roman ; MEIR, Roi ; LEVIN, Sahar ; LEVI, Shimon</creatorcontrib><description>A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.</description><language>eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211209&DB=EPODOC&CC=US&NR=2021383529A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211209&DB=EPODOC&CC=US&NR=2021383529A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DUVDEVANI-BAR, Sharon</creatorcontrib><creatorcontrib>YOSHIZAWA, Taku</creatorcontrib><creatorcontrib>SAHA, Kasturi</creatorcontrib><creatorcontrib>NOIFELD, Efrat</creatorcontrib><creatorcontrib>VERESCHAGIN, Vadim</creatorcontrib><creatorcontrib>KLEBANOV, Grigory</creatorcontrib><creatorcontrib>MIROKU, Hiroshi</creatorcontrib><creatorcontrib>SCHWARZBAND, Ishai</creatorcontrib><creatorcontrib>KRIS, Roman</creatorcontrib><creatorcontrib>MEIR, Roi</creatorcontrib><creatorcontrib>LEVIN, Sahar</creatorcontrib><creatorcontrib>LEVI, Shimon</creatorcontrib><title>METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY</title><description>A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD3dQ3x8HfRUQiODA5x9VVw9HNRcPb3DQgNcQ1SCAjydw9y9AXRLqHOIQpu_kEKxi66fmBFLsFA5UDdQf4-_u6RPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPjTYyMDI0NjC2NTI0tHQmDhVAH_oLW8</recordid><startdate>20211209</startdate><enddate>20211209</enddate><creator>DUVDEVANI-BAR, Sharon</creator><creator>YOSHIZAWA, Taku</creator><creator>SAHA, Kasturi</creator><creator>NOIFELD, Efrat</creator><creator>VERESCHAGIN, Vadim</creator><creator>KLEBANOV, Grigory</creator><creator>MIROKU, Hiroshi</creator><creator>SCHWARZBAND, Ishai</creator><creator>KRIS, Roman</creator><creator>MEIR, Roi</creator><creator>LEVIN, Sahar</creator><creator>LEVI, Shimon</creator><scope>EVB</scope></search><sort><creationdate>20211209</creationdate><title>METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY</title><author>DUVDEVANI-BAR, Sharon ; YOSHIZAWA, Taku ; SAHA, Kasturi ; NOIFELD, Efrat ; VERESCHAGIN, Vadim ; KLEBANOV, Grigory ; MIROKU, Hiroshi ; SCHWARZBAND, Ishai ; KRIS, Roman ; MEIR, Roi ; LEVIN, Sahar ; LEVI, Shimon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2021383529A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>DUVDEVANI-BAR, Sharon</creatorcontrib><creatorcontrib>YOSHIZAWA, Taku</creatorcontrib><creatorcontrib>SAHA, Kasturi</creatorcontrib><creatorcontrib>NOIFELD, Efrat</creatorcontrib><creatorcontrib>VERESCHAGIN, Vadim</creatorcontrib><creatorcontrib>KLEBANOV, Grigory</creatorcontrib><creatorcontrib>MIROKU, Hiroshi</creatorcontrib><creatorcontrib>SCHWARZBAND, Ishai</creatorcontrib><creatorcontrib>KRIS, Roman</creatorcontrib><creatorcontrib>MEIR, Roi</creatorcontrib><creatorcontrib>LEVIN, Sahar</creatorcontrib><creatorcontrib>LEVI, Shimon</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DUVDEVANI-BAR, Sharon</au><au>YOSHIZAWA, Taku</au><au>SAHA, Kasturi</au><au>NOIFELD, Efrat</au><au>VERESCHAGIN, Vadim</au><au>KLEBANOV, Grigory</au><au>MIROKU, Hiroshi</au><au>SCHWARZBAND, Ishai</au><au>KRIS, Roman</au><au>MEIR, Roi</au><au>LEVIN, Sahar</au><au>LEVI, Shimon</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY</title><date>2021-12-09</date><risdate>2021</risdate><abstract>A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING |
| title | METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY |
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