SUBSTRATE PROCESSING METHOD FOR FORMING INNER SPACERS IN A NANO-SHEET DEVICE

A method including depositing a dielectric film on a substrate including stacked structures with recessed portions formed on side surfaces of each of the stacked structures, wherein the dielectric film is deposited so that the stacked structures are covered at a thickness which is equal to or less t...

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Bibliographische Detailangaben

Hauptverfasser:	YAMAGUCHI, Shimpei, ENDO, Atsushi, IGETA, Masanobu, SUGIMOTO, Masaru, FERNANDEZ, Luis, TSUBOI, Atsushi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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