SUBSTRATE TREATING APPARATUS AND LIQUID SUPPLYING METHOD

The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a l...

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Bibliographische Detailangaben
Hauptverfasser: JEON, Myung A, LEE, Sul, HONG, Yong Hoon, KIM, Young Su, CHOI, Moonsik
Format: Patent
Sprache:eng
Schlagworte:
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