PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

A plasma processing apparatus according to an exemplary embodiment includes a chamber, a member, and a heater. Plasma is generated in an internal space of the chamber. The member is partially located in the internal space of the chamber. The heater is configured to heat the member. The member extend...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAYASAKA, Yusuke, TANIKAWA, Takehiro, YAMABE, Shuhei, CHUNG, Jun Young, MACHIDA, Yuki
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:A plasma processing apparatus according to an exemplary embodiment includes a chamber, a member, and a heater. Plasma is generated in an internal space of the chamber. The member is partially located in the internal space of the chamber. The heater is configured to heat the member. The member extends outward from the internal space of the chamber and is exposed to a space outside the chamber.