METHOD AND APPARATUS FOR PERFORMING AN AERIAL IMAGE SIMULATION OF A PHOTOLITHOGRAPHIC MASK

The present invention refers to a method for performing an aerial image simulation of a photolithographic mask which comprises the following steps: (a) modifying an optical radiation distribution at a patterned surface of the photolithographic mask, depending on at least one first arrangement of pix...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Welte, Joachim, Geh, Bernd, Graeupner, Paul, Dmitriev, Vladimir, Schauer, Anja
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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