HYBRID WAFER DICING APPROACH USING A SPATIALLY MULTI-FOCUSED LASER BEAM LASER SCRIBING PROCESS AND PLASMA ETCH PROCESS

Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a method of dicing a semiconductor wafer having a plurality of integrated circuits involves forming a mask above the semiconductor wafer, the mask composed of a layer covering...

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Bibliographische Detailangaben
Hauptverfasser: Papanu, James S, Park, Jungrae, Tan, Zavier Zai Yeong
Format: Patent
Sprache:eng
Schlagworte:
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