Process Chamber and Substrate Processing Apparatus Including the Same

A process chamber and a substrate processing apparatus including the same are disclosed. The process chamber includes a first housing and a second housing on the first housing. The first housing includes a first outer wall, a first partition wall facing the first outer wall, and a first side wall co...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Cho, Yong-Jhin, Oh, Jung-Min, Lee, Kuntack, Lee, Hyosan, Kim, Young-Hoo, Jeong, Jihoon, Kim, Yungjun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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