Synchronized Parallel Tile Computation for Large Area Lithography Simulation
Examples of synchronized parallel tile computation techniques for large area lithography simulation are disclosed herein for solving tile boundary issues. An exemplary method for integrated circuit (IC) fabrication comprises receiving an IC design layout, partitioning the IC design layout into a plu...
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creator | Xu, Fangbo Peng, Danping Lei, Junjiang Beylkin, Daniel Trivedi, Sagar Ho, Kenneth Lik Kin |
description | Examples of synchronized parallel tile computation techniques for large area lithography simulation are disclosed herein for solving tile boundary issues. An exemplary method for integrated circuit (IC) fabrication comprises receiving an IC design layout, partitioning the IC design layout into a plurality of tiles, performing a simulated imaging process on the plurality of tiles, generating a modified IC design layout by combining final synchronized image values from the plurality of tiles, and providing the modified IC design layout for fabricating a mask. Performing the simulated imaging process comprises executing a plurality of imaging steps on each of the plurality of tiles. Executing each of the plurality of imaging steps comprises synchronizing image values from the plurality of tiles via data exchange between neighboring tiles. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2021181713A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2021181713A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2021181713A13</originalsourceid><addsrcrecordid>eNqNyrEKwjAQANAsDqL-w0FnwbSDrqUoDhmE1Lkc9doE0ly4pkP9ekH8AKe3vK0ydo29E47-TS94oGAIFKD1gaDhKS0Zs-cIAwsYlJGgFkIwPjseBZNbwfppCd-1V5sBw0yHnztV3K5tcz9S4o7mhD1Fyt3TlqdS64s-66rW1X_rA3svNsQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Synchronized Parallel Tile Computation for Large Area Lithography Simulation</title><source>esp@cenet</source><creator>Xu, Fangbo ; Peng, Danping ; Lei, Junjiang ; Beylkin, Daniel ; Trivedi, Sagar ; Ho, Kenneth Lik Kin</creator><creatorcontrib>Xu, Fangbo ; Peng, Danping ; Lei, Junjiang ; Beylkin, Daniel ; Trivedi, Sagar ; Ho, Kenneth Lik Kin</creatorcontrib><description>Examples of synchronized parallel tile computation techniques for large area lithography simulation are disclosed herein for solving tile boundary issues. An exemplary method for integrated circuit (IC) fabrication comprises receiving an IC design layout, partitioning the IC design layout into a plurality of tiles, performing a simulated imaging process on the plurality of tiles, generating a modified IC design layout by combining final synchronized image values from the plurality of tiles, and providing the modified IC design layout for fabricating a mask. Performing the simulated imaging process comprises executing a plurality of imaging steps on each of the plurality of tiles. Executing each of the plurality of imaging steps comprises synchronizing image values from the plurality of tiles via data exchange between neighboring tiles.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; HOLOGRAPHY ; MATERIALS THEREFOR ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; REGULATING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210617&DB=EPODOC&CC=US&NR=2021181713A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210617&DB=EPODOC&CC=US&NR=2021181713A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Xu, Fangbo</creatorcontrib><creatorcontrib>Peng, Danping</creatorcontrib><creatorcontrib>Lei, Junjiang</creatorcontrib><creatorcontrib>Beylkin, Daniel</creatorcontrib><creatorcontrib>Trivedi, Sagar</creatorcontrib><creatorcontrib>Ho, Kenneth Lik Kin</creatorcontrib><title>Synchronized Parallel Tile Computation for Large Area Lithography Simulation</title><description>Examples of synchronized parallel tile computation techniques for large area lithography simulation are disclosed herein for solving tile boundary issues. An exemplary method for integrated circuit (IC) fabrication comprises receiving an IC design layout, partitioning the IC design layout into a plurality of tiles, performing a simulated imaging process on the plurality of tiles, generating a modified IC design layout by combining final synchronized image values from the plurality of tiles, and providing the modified IC design layout for fabricating a mask. Performing the simulated imaging process comprises executing a plurality of imaging steps on each of the plurality of tiles. Executing each of the plurality of imaging steps comprises synchronizing image values from the plurality of tiles via data exchange between neighboring tiles.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>REGULATING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQANAsDqL-w0FnwbSDrqUoDhmE1Lkc9doE0ly4pkP9ekH8AKe3vK0ydo29E47-TS94oGAIFKD1gaDhKS0Zs-cIAwsYlJGgFkIwPjseBZNbwfppCd-1V5sBw0yHnztV3K5tcz9S4o7mhD1Fyt3TlqdS64s-66rW1X_rA3svNsQ</recordid><startdate>20210617</startdate><enddate>20210617</enddate><creator>Xu, Fangbo</creator><creator>Peng, Danping</creator><creator>Lei, Junjiang</creator><creator>Beylkin, Daniel</creator><creator>Trivedi, Sagar</creator><creator>Ho, Kenneth Lik Kin</creator><scope>EVB</scope></search><sort><creationdate>20210617</creationdate><title>Synchronized Parallel Tile Computation for Large Area Lithography Simulation</title><author>Xu, Fangbo ; Peng, Danping ; Lei, Junjiang ; Beylkin, Daniel ; Trivedi, Sagar ; Ho, Kenneth Lik Kin</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2021181713A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>ELECTROGRAPHY</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>REGULATING</topic><toplevel>online_resources</toplevel><creatorcontrib>Xu, Fangbo</creatorcontrib><creatorcontrib>Peng, Danping</creatorcontrib><creatorcontrib>Lei, Junjiang</creatorcontrib><creatorcontrib>Beylkin, Daniel</creatorcontrib><creatorcontrib>Trivedi, Sagar</creatorcontrib><creatorcontrib>Ho, Kenneth Lik Kin</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Xu, Fangbo</au><au>Peng, Danping</au><au>Lei, Junjiang</au><au>Beylkin, Daniel</au><au>Trivedi, Sagar</au><au>Ho, Kenneth Lik Kin</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Synchronized Parallel Tile Computation for Large Area Lithography Simulation</title><date>2021-06-17</date><risdate>2021</risdate><abstract>Examples of synchronized parallel tile computation techniques for large area lithography simulation are disclosed herein for solving tile boundary issues. An exemplary method for integrated circuit (IC) fabrication comprises receiving an IC design layout, partitioning the IC design layout into a plurality of tiles, performing a simulated imaging process on the plurality of tiles, generating a modified IC design layout by combining final synchronized image values from the plurality of tiles, and providing the modified IC design layout for fabricating a mask. Performing the simulated imaging process comprises executing a plurality of imaging steps on each of the plurality of tiles. Executing each of the plurality of imaging steps comprises synchronizing image values from the plurality of tiles via data exchange between neighboring tiles.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING |
title | Synchronized Parallel Tile Computation for Large Area Lithography Simulation |
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