SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

A semiconductor device may include first channels on a first region of a substrate and spaced apart from each other in a vertical direction substantially perpendicular to an upper surface of the substrate, second channels on a second region of the substrate and spaced apart from each other in the ve...

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Bibliographische Detailangaben
Hauptverfasser: MA, JAE-HYEOUNG, NOH, CHANG-WOO, BAE, DONG-IL
Format: Patent
Sprache:eng
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