LIGHT-IRRADIATION THERMAL TREATMENT APPARATUS

A ring support is attached to an inner wall surface of a chamber that houses a semiconductor wafer to support a susceptor. When the semiconductor wafer is placed on the susceptor, an inner space of the chamber is separated into an upper space and a lower space. Particles are likely to accumulate on...

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Bibliographische Detailangaben
Hauptverfasser: MIYAWAKI, Shinji, ABE, Makoto, YAMADA, Takahiro, WATANABE, Jun, FUSE, Kazuhiko
Format: Patent
Sprache:eng
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