SURFACE TREATMENT APPARATUS AND SURFACE TREATMENT METHOD
Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.
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| creator | KIM, Sun Mi GOH, Jung Suk CUI, Cheng Bin KIM, Kuk Saeng HONG, Ji Su HEO, Pil Kyun |
| description | Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate. |
| format | Patent |
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| language | eng |
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| subjects | BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING |
| title | SURFACE TREATMENT APPARATUS AND SURFACE TREATMENT METHOD |
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