Substrate Processing Apparatus and Gas Box

Described herein is a technique capable of preventing a deterioration in controllability of a gas flow rate in a substrate processing apparatus. According to one aspect thereof a substrate processing apparatus includes: a process furnace including a process chamber; a process gas supply path; a proc...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NABETA, Kazuya, TAKEWAKI, Motoya
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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