PRECISION SPACING CONTROL FOR OPTICAL WAVEGUIDES

Aspects described herein include a method of fabricating an optical apparatus. The method comprises etching a plurality of trenches partly through a first optical waveguide formed in a first semiconductor layer, wherein a first ridge is formed in the first optical waveguide between adjacent trenches...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: ZHANG, Xunyuan
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!