Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies

Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies

A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Srivastava, Shailendra, Rocha, Juan Carlos, Dzilno, Dmitry A, Jorapur, Nikhil Sudhindrarao, Mukuti, Ndanka O, Ye, Zheng John, Benjamin Raj, Daemian Raj
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Srivastava, Shailendra
Rocha, Juan Carlos
Dzilno, Dmitry A
Jorapur, Nikhil Sudhindrarao
Mukuti, Ndanka O
Ye, Zheng John
Benjamin Raj, Daemian Raj
description A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to provide feedback control for an RF generator.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2021059037A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2021059037A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2021059037A13</originalsourceid><addsrcrecordid>eNrjZPD2TS3JyE8pVkjMS1FwLChILEosKS1WSMsvUnDOzyspys_JycxLVwhyUwgASuWmlqQWAdWWKPiW5pRkFuSkKrgVpRaWpuYlZ6YW8zCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-NBgIwMjQwNTSwNjc0dDY-JUAQAFlDYR</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies</title><source>esp@cenet</source><creator>Srivastava, Shailendra ; Rocha, Juan Carlos ; Dzilno, Dmitry A ; Jorapur, Nikhil Sudhindrarao ; Mukuti, Ndanka O ; Ye, Zheng John ; Benjamin Raj, Daemian Raj</creator><creatorcontrib>Srivastava, Shailendra ; Rocha, Juan Carlos ; Dzilno, Dmitry A ; Jorapur, Nikhil Sudhindrarao ; Mukuti, Ndanka O ; Ye, Zheng John ; Benjamin Raj, Daemian Raj</creatorcontrib><description>A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to provide feedback control for an RF generator.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210225&amp;DB=EPODOC&amp;CC=US&amp;NR=2021059037A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210225&amp;DB=EPODOC&amp;CC=US&amp;NR=2021059037A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Srivastava, Shailendra</creatorcontrib><creatorcontrib>Rocha, Juan Carlos</creatorcontrib><creatorcontrib>Dzilno, Dmitry A</creatorcontrib><creatorcontrib>Jorapur, Nikhil Sudhindrarao</creatorcontrib><creatorcontrib>Mukuti, Ndanka O</creatorcontrib><creatorcontrib>Ye, Zheng John</creatorcontrib><creatorcontrib>Benjamin Raj, Daemian Raj</creatorcontrib><title>Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies</title><description>A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to provide feedback control for an RF generator.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD2TS3JyE8pVkjMS1FwLChILEosKS1WSMsvUnDOzyspys_JycxLVwhyUwgASuWmlqQWAdWWKPiW5pRkFuSkKrgVpRaWpuYlZ6YW8zCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-NBgIwMjQwNTSwNjc0dDY-JUAQAFlDYR</recordid><startdate>20210225</startdate><enddate>20210225</enddate><creator>Srivastava, Shailendra</creator><creator>Rocha, Juan Carlos</creator><creator>Dzilno, Dmitry A</creator><creator>Jorapur, Nikhil Sudhindrarao</creator><creator>Mukuti, Ndanka O</creator><creator>Ye, Zheng John</creator><creator>Benjamin Raj, Daemian Raj</creator><scope>EVB</scope></search><sort><creationdate>20210225</creationdate><title>Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies</title><author>Srivastava, Shailendra ; Rocha, Juan Carlos ; Dzilno, Dmitry A ; Jorapur, Nikhil Sudhindrarao ; Mukuti, Ndanka O ; Ye, Zheng John ; Benjamin Raj, Daemian Raj</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2021059037A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>Srivastava, Shailendra</creatorcontrib><creatorcontrib>Rocha, Juan Carlos</creatorcontrib><creatorcontrib>Dzilno, Dmitry A</creatorcontrib><creatorcontrib>Jorapur, Nikhil Sudhindrarao</creatorcontrib><creatorcontrib>Mukuti, Ndanka O</creatorcontrib><creatorcontrib>Ye, Zheng John</creatorcontrib><creatorcontrib>Benjamin Raj, Daemian Raj</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Srivastava, Shailendra</au><au>Rocha, Juan Carlos</au><au>Dzilno, Dmitry A</au><au>Jorapur, Nikhil Sudhindrarao</au><au>Mukuti, Ndanka O</au><au>Ye, Zheng John</au><au>Benjamin Raj, Daemian Raj</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies</title><date>2021-02-25</date><risdate>2021</risdate><abstract>A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to provide feedback control for an RF generator.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2021059037A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
title Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T14%3A03%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Srivastava,%20Shailendra&rft.date=2021-02-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2021059037A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true