HEATED SUBSTRATE SUPPORT WITH THERMAL BAFFLES

Embodiments of substrate supports for use in a process chamber are provided herein. In some embodiments a substrate support for use in a process chamber includes a pedestal having an upper surface for supporting a substrate and an opposite lower surface, a first heater disposed within the pedestal b...

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Bibliographische Detailangaben

Hauptverfasser:	PATANKAR, Sumit S, RUHLAND, Fred Eric
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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