Apparatus For and Method of In-Situ Particle Removal in a Lithography Apparatus
Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from th...
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| creator | BRULS, Richard Joseph PEREZ-FALCON, Victor Antonio ALBRIGHT, Ronald Peter KOCHERSPERGER, Peter Conrad |
| description | Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface. |
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Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; CLEANING ; CLEANING IN GENERAL ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210211&DB=EPODOC&CC=US&NR=2021041795A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210211&DB=EPODOC&CC=US&NR=2021041795A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BRULS, Richard Joseph</creatorcontrib><creatorcontrib>PEREZ-FALCON, Victor Antonio</creatorcontrib><creatorcontrib>ALBRIGHT, Ronald Peter</creatorcontrib><creatorcontrib>KOCHERSPERGER, Peter Conrad</creatorcontrib><title>Apparatus For and Method of In-Situ Particle Removal in a Lithography Apparatus</title><description>Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB3LChILEosKS1WcMsvUkjMS1HwTS3JyE9RyE9T8MzTDc4sKVUISCwqyUzOSVUISs3NL0vMUcjMU0hU8MkEqksvSizIqFSAm8LDwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-JDg40MjAwNTAzNLU0dDY2JUwUAl7M20A</recordid><startdate>20210211</startdate><enddate>20210211</enddate><creator>BRULS, Richard Joseph</creator><creator>PEREZ-FALCON, Victor Antonio</creator><creator>ALBRIGHT, Ronald Peter</creator><creator>KOCHERSPERGER, Peter Conrad</creator><scope>EVB</scope></search><sort><creationdate>20210211</creationdate><title>Apparatus For and Method of In-Situ Particle Removal in a Lithography Apparatus</title><author>BRULS, Richard Joseph ; PEREZ-FALCON, Victor Antonio ; ALBRIGHT, Ronald Peter ; KOCHERSPERGER, Peter Conrad</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2021041795A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BRULS, Richard Joseph</creatorcontrib><creatorcontrib>PEREZ-FALCON, Victor Antonio</creatorcontrib><creatorcontrib>ALBRIGHT, Ronald Peter</creatorcontrib><creatorcontrib>KOCHERSPERGER, Peter Conrad</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BRULS, Richard Joseph</au><au>PEREZ-FALCON, Victor Antonio</au><au>ALBRIGHT, Ronald Peter</au><au>KOCHERSPERGER, Peter Conrad</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus For and Method of In-Situ Particle Removal in a Lithography Apparatus</title><date>2021-02-11</date><risdate>2021</risdate><abstract>Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL TRANSPORTING |
| title | Apparatus For and Method of In-Situ Particle Removal in a Lithography Apparatus |
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