APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

An apparatus and method for processing a substrate using plasma, which has high plasma stability and process reproducibility, is provided. The method includes providing an apparatus for processing a substrate comprising a plasma generating region and a process region separate from the plasma generat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Park, Wan Jae, Oh, Dong Sub, Oh, Sehoon, Lee, Ji-Hwan, Lee, Seong Gil, Kim, Dong-Hun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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