SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

A method for fabricating a semiconductor device includes forming a stack structure including a horizontal recess over a substrate, forming a blocking layer lining the horizontal recess, forming an interface control layer including a dielectric barrier element and a conductive barrier element over th...

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Hauptverfasser:	LEE, Kwang-Wook, YANG, Young-Ho, SHIM, Jung-Myoung, CHOI, Won-Joon, EOM, Hyeng-Woo
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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creator	LEE, Kwang-Wook YANG, Young-Ho SHIM, Jung-Myoung CHOI, Won-Joon EOM, Hyeng-Woo
description	A method for fabricating a semiconductor device includes forming a stack structure including a horizontal recess over a substrate, forming a blocking layer lining the horizontal recess, forming an interface control layer including a dielectric barrier element and a conductive barrier element over the blocking layer, and forming a conductive layer over the interface control layer to fill the horizontal recess.
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title	SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
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