CLEANSING SUBSTRATE WITH SYNCHRONIZED PRINTED AND EXPANDED TEXTURE
The current disclosure provides for a woven or nonwoven textured substrate that is stable in water based solutions. The textured substrate is generated by a controlled placement of ink on to portions of the surface and/or between layers of the textured substrate which is then followed by heat activa...
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| creator | Bednar, Jenna L Thelen, Amanda Creagan, Christopher C Poruthoor, Simon K Vogel, Nathan J |
| description | The current disclosure provides for a woven or nonwoven textured substrate that is stable in water based solutions. The textured substrate is generated by a controlled placement of ink on to portions of the surface and/or between layers of the textured substrate which is then followed by heat activation which expands the ink to puff out where the ink was applied to the textured substrate. |
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The textured substrate is generated by a controlled placement of ink on to portions of the surface and/or between layers of the textured substrate which is then followed by heat activation which expands the ink to puff out where the ink was applied to the textured substrate.</description><language>eng</language><subject>BRAIDING ; COTTON-WOOL ; DYEING LEATHER, FURS, OR SOLID MACROMOLECULAR SUBSTANCES INANY FORM ; DYEING OR PRINTING TEXTILES ; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS ; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR ; KNITTING ; LACE-MAKING ; LAUNDERING ; MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL ; NON-WOVEN FABRICS ; TEXTILES ; TREATMENT OF TEXTILES OR THE LIKE ; TRIMMINGS ; WADDING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201210&DB=EPODOC&CC=US&NR=2020385923A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201210&DB=EPODOC&CC=US&NR=2020385923A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Bednar, Jenna L</creatorcontrib><creatorcontrib>Thelen, Amanda</creatorcontrib><creatorcontrib>Creagan, Christopher C</creatorcontrib><creatorcontrib>Poruthoor, Simon K</creatorcontrib><creatorcontrib>Vogel, Nathan J</creatorcontrib><title>CLEANSING SUBSTRATE WITH SYNCHRONIZED PRINTED AND EXPANDED TEXTURE</title><description>The current disclosure provides for a woven or nonwoven textured substrate that is stable in water based solutions. 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| subjects | BRAIDING COTTON-WOOL DYEING LEATHER, FURS, OR SOLID MACROMOLECULAR SUBSTANCES INANY FORM DYEING OR PRINTING TEXTILES FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR KNITTING LACE-MAKING LAUNDERING MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL NON-WOVEN FABRICS TEXTILES TREATMENT OF TEXTILES OR THE LIKE TRIMMINGS WADDING |
| title | CLEANSING SUBSTRATE WITH SYNCHRONIZED PRINTED AND EXPANDED TEXTURE |
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