MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDING THE SAME

A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a sha...

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Hauptverfasser: Kang, Minho, Jung, Daesung, Choi, Younsok, Soh, Sangyoon, Song, Jongmin, Lee, Hohyun
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creator Kang, Minho
Jung, Daesung
Choi, Younsok
Soh, Sangyoon
Song, Jongmin
Lee, Hohyun
description A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2020333716A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2020333716A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2020333716A13</originalsourceid><addsrcrecordid>eNrjZPDzdXUMDg3y9HNXcAwIcAxyDAkNVnDzD1IIc3QODfVVcPZw9HVyDVJw9HNRQCgNjgwOcfVV8PRz9gl1AQmEeLgqBDv6uvIwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDIwNjY2NzQzNHQ2PiVAEA2cEvbA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDING THE SAME</title><source>esp@cenet</source><creator>Kang, Minho ; Jung, Daesung ; Choi, Younsok ; Soh, Sangyoon ; Song, Jongmin ; Lee, Hohyun</creator><creatorcontrib>Kang, Minho ; Jung, Daesung ; Choi, Younsok ; Soh, Sangyoon ; Song, Jongmin ; Lee, Hohyun</creatorcontrib><description>A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201022&amp;DB=EPODOC&amp;CC=US&amp;NR=2020333716A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201022&amp;DB=EPODOC&amp;CC=US&amp;NR=2020333716A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Kang, Minho</creatorcontrib><creatorcontrib>Jung, Daesung</creatorcontrib><creatorcontrib>Choi, Younsok</creatorcontrib><creatorcontrib>Soh, Sangyoon</creatorcontrib><creatorcontrib>Song, Jongmin</creatorcontrib><creatorcontrib>Lee, Hohyun</creatorcontrib><title>MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDING THE SAME</title><description>A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDzdXUMDg3y9HNXcAwIcAxyDAkNVnDzD1IIc3QODfVVcPZw9HVyDVJw9HNRQCgNjgwOcfVV8PRz9gl1AQmEeLgqBDv6uvIwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDIwNjY2NzQzNHQ2PiVAEA2cEvbA</recordid><startdate>20201022</startdate><enddate>20201022</enddate><creator>Kang, Minho</creator><creator>Jung, Daesung</creator><creator>Choi, Younsok</creator><creator>Soh, Sangyoon</creator><creator>Song, Jongmin</creator><creator>Lee, Hohyun</creator><scope>EVB</scope></search><sort><creationdate>20201022</creationdate><title>MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDING THE SAME</title><author>Kang, Minho ; Jung, Daesung ; Choi, Younsok ; Soh, Sangyoon ; Song, Jongmin ; Lee, Hohyun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2020333716A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Kang, Minho</creatorcontrib><creatorcontrib>Jung, Daesung</creatorcontrib><creatorcontrib>Choi, Younsok</creatorcontrib><creatorcontrib>Soh, Sangyoon</creatorcontrib><creatorcontrib>Song, Jongmin</creatorcontrib><creatorcontrib>Lee, Hohyun</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kang, Minho</au><au>Jung, Daesung</au><au>Choi, Younsok</au><au>Soh, Sangyoon</au><au>Song, Jongmin</au><au>Lee, Hohyun</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDING THE SAME</title><date>2020-10-22</date><risdate>2020</risdate><abstract>A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDING THE SAME
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T09%3A05%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Kang,%20Minho&rft.date=2020-10-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2020333716A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true