APPARATUS AND METHOD FOR PROCESSING, COATING OR CURING A SUBSTRATE
An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array com...
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| creator | Topping, Alexander John Shipman, James Tiw Jarman, Robert William |
| description | An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2020263298A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2020263298A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2020263298A13</originalsourceid><addsrcrecordid>eNrjZHByDAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9SCAjyd3YNDvb0c9dRcPZ3DAEyFIDCzqFBIJajQnCoU3AIUKcrDwNrWmJOcSovlOZmUHZzDXH20E0tyI9PLS5ITE7NSy2JDw02MgBCM2MjSwtHQ2PiVAEAm7YsAg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUS AND METHOD FOR PROCESSING, COATING OR CURING A SUBSTRATE</title><source>esp@cenet</source><creator>Topping, Alexander John ; Shipman, James Tiw ; Jarman, Robert William</creator><creatorcontrib>Topping, Alexander John ; Shipman, James Tiw ; Jarman, Robert William</creatorcontrib><description>An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.</description><language>eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200820&DB=EPODOC&CC=US&NR=2020263298A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200820&DB=EPODOC&CC=US&NR=2020263298A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Topping, Alexander John</creatorcontrib><creatorcontrib>Shipman, James Tiw</creatorcontrib><creatorcontrib>Jarman, Robert William</creatorcontrib><title>APPARATUS AND METHOD FOR PROCESSING, COATING OR CURING A SUBSTRATE</title><description>An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHByDAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9SCAjyd3YNDvb0c9dRcPZ3DAEyFIDCzqFBIJajQnCoU3AIUKcrDwNrWmJOcSovlOZmUHZzDXH20E0tyI9PLS5ITE7NSy2JDw02MgBCM2MjSwtHQ2PiVAEAm7YsAg</recordid><startdate>20200820</startdate><enddate>20200820</enddate><creator>Topping, Alexander John</creator><creator>Shipman, James Tiw</creator><creator>Jarman, Robert William</creator><scope>EVB</scope></search><sort><creationdate>20200820</creationdate><title>APPARATUS AND METHOD FOR PROCESSING, COATING OR CURING A SUBSTRATE</title><author>Topping, Alexander John ; Shipman, James Tiw ; Jarman, Robert William</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2020263298A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Topping, Alexander John</creatorcontrib><creatorcontrib>Shipman, James Tiw</creatorcontrib><creatorcontrib>Jarman, Robert William</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Topping, Alexander John</au><au>Shipman, James Tiw</au><au>Jarman, Robert William</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND METHOD FOR PROCESSING, COATING OR CURING A SUBSTRATE</title><date>2020-08-20</date><risdate>2020</risdate><abstract>An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | APPARATUS AND METHOD FOR PROCESSING, COATING OR CURING A SUBSTRATE |
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