SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD

A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical whi...

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1. Verfasser: Aoto, Tadashi
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creator Aoto, Tadashi
description A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical while having gas permeability.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2020243372A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2020243372A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2020243372A13</originalsourceid><addsrcrecordid>eNrjZLAPDg12dg0I8Q_SUQgOdQoOCXIMcVUICPJ3dg0O9vRzV3AMCHAEioUGKzj6uYAkQlydQzz9_RR8XUM8_F14GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRARCaGBubGzkaGhOnCgBudSvG</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD</title><source>esp@cenet</source><creator>Aoto, Tadashi</creator><creatorcontrib>Aoto, Tadashi</creatorcontrib><description>A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical while having gas permeability.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200730&amp;DB=EPODOC&amp;CC=US&amp;NR=2020243372A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200730&amp;DB=EPODOC&amp;CC=US&amp;NR=2020243372A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Aoto, Tadashi</creatorcontrib><title>SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD</title><description>A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical while having gas permeability.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAPDg12dg0I8Q_SUQgOdQoOCXIMcVUICPJ3dg0O9vRzV3AMCHAEioUGKzj6uYAkQlydQzz9_RR8XUM8_F14GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRARCaGBubGzkaGhOnCgBudSvG</recordid><startdate>20200730</startdate><enddate>20200730</enddate><creator>Aoto, Tadashi</creator><scope>EVB</scope></search><sort><creationdate>20200730</creationdate><title>SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD</title><author>Aoto, Tadashi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2020243372A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Aoto, Tadashi</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Aoto, Tadashi</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD</title><date>2020-07-30</date><risdate>2020</risdate><abstract>A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical while having gas permeability.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-03T11%3A46%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Aoto,%20Tadashi&rft.date=2020-07-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2020243372A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true