SUSCEPTOR, SUBSTRATE PROCESSING APPARATUS AND PROTECTION METHOD

A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical whi...

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Bibliographische Detailangaben
1. Verfasser: Aoto, Tadashi
Format: Patent
Sprache:eng
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Zusammenfassung:A susceptor includes a base; a substrate placing member provided on the base; a bonding layer configured to bond the base and the substrate placing member; and a protection member disposed in a space which an outer peripheral surface of the bonding layer faces and allowed to deactivate a radical while having gas permeability.