METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE PARAMETER

A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a sub...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN GORP, Simon Hendrik Celine, SEGERS, Bart Peter Bert, STAALS, Frank, VAN DER LOGT, Léon Maria Albertus, LUIJTEN, Carlos Cornelis Maria
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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