SILICON MANDREL ETCH AFTER NATIVE OXIDE PUNCH-THROUGH

Apparatus, systems, and methods for conducting a silicon containing material removal process on a workpiece are provided. In one example implementation, the method can include generating species from a process gas in a first chamber using an inductive coupling element. The method can include introdu...

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Bibliographische Detailangaben

Hauptverfasser:	Lo, Sio On, Sung, Tsai Wen, Chung, Hua, Yan, Chun, Yang, Michael X
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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