TRANSISTOR GATE STRUCTURE WITH HYBRID STACKS OF DIELECTRIC MATERIAL

An integrated circuit includes a gate structure in contact with a portion of semiconductor material between a source region and a drain region. The gate structure includes gate dielectric and a gate electrode. The gate dielectric includes at least two hybrid stacks of dielectric material. Each hybri...

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Bibliographische Detailangaben
Hauptverfasser: Rode, Johann C, Beach, Samuel J, Then, Han Wui, Ramaswamy, Rahul, Hafez, Walid, Nidhi, Nidhi
Format: Patent
Sprache:eng
Schlagworte:
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