Constructing VIA Meshes for High Performance Routing on Silicon Chips

System and method for configuring via meshes for a semiconductor circuit having at least a bottom layer and a top layer each having a plurality of parallel conductive straps, and vias to interconnect straps in the bottom layer to the top layer to provide conductive routing pathways is disclosed. The...

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Bibliographische Detailangaben
Hauptverfasser: Schulte, Christian, Peyer, Sven
Format: Patent
Sprache:eng
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Zusammenfassung:System and method for configuring via meshes for a semiconductor circuit having at least a bottom layer and a top layer each having a plurality of parallel conductive straps, and vias to interconnect straps in the bottom layer to the top layer to provide conductive routing pathways is disclosed. The method and system include inputting predefined criteria for the via mesh, and configuring feasible straps in the bottom layer of straps using a set of predefined rules and configuring feasible straps for the top layer, and optionally the intermediate layers using the set of predefined rules. The predefined criteria preferably includes one or all of: defining the bottom and top layer connection locations, defining a set of predefined tracks for each layer, defining the number of layers and straps in each layer, and combinations thereof.