MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM

A mirror having a mirror substrate (12, 32, 52), a reflection layer stack (21, 41, 61) reflecting electromagnetic radiation having an operating wavelength that is incident on the optical effective surface (11, 31, 51), and at least one piezoelectric layer (16, 36, 56), arranged between the substrate...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GRUNER, Toralf, BIJKERK, Frederik, WYLIE-VAN EERD, Ben, HILD, Kerstin, WEYLER, Simone, SCHULTE, Stefan
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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