Semiconductor Device and Method of Manufacture

An etchant is utilized to remove a semiconductor material. In some embodiments an oxidizer is added to the etchant in order to react with surrounding semiconductor material and form a protective layer. The protective layer is utilized to help prevent damage that could occur from the other components...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lian, Jian-Jou, Chen, Li-Min, Lin, Shun Wu, Huang, Kuo-Bin, Yang, Neng-Jye, Yeh, Ming-Hsi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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