LASER APPARATUS AND SUBSTRATE ETCHING METHOD USING THE SAME

A laser apparatus may include a laser generator generating at least one a laser beam, which is used as an input light, an optical system converting the input light, which is provided from the laser generator, into a plurality of pattern lights, and a stage, on which a target object is loaded. The ou...

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Bibliographische Detailangaben
Hauptverfasser: BAE, Yoongyeong, OH, Taekil, AHN, Jooseob, HAN, Gyoowan, KO, Yeonghwan
Format: Patent
Sprache:eng
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