SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

An apparatus for processing reaction products that are deposited when an etching target film contained in a target object to be processed is etched is provided with: a processing chamber; a partition plate; a plasma source; a mounting table; a first processing gas supply unit; a second processing ga...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIMIZU, Akitaka, NISHIMURA, Eiichi, YAMASHITA, Fumiko, URAYAMA, Daisuke
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!