SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Disclosed are semiconductor devices and methods of fabricating the same. The semiconductor device comprises a substrate having a trench, a gate dielectric layer covering a surface of the trench, a gate electrode filling a lower portion of the trench, a capping pattern on the gate electrode in the tr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HWANG, YOOSANG, KIM, KEUNNAM
Format: Patent
Sprache:eng
Schlagworte:
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