HEAT TREATMENT METHOD OF SUBSTRATE AND APPARATUS THEREOF

HEAT TREATMENT METHOD OF SUBSTRATE AND APPARATUS THEREOF

A heat treatment method of a substrate includes setting a temperature profile over the course of stabilization to a target temperature after the substrate is loaded as a reference, and controlling a temperature of the hot plate supporting the substrate on the basis of the reference.

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Bibliographische Detailangaben
Hauptverfasser: KIM, Bong Kuk, LEE, Sung Yong, SEO, Dong Hyuk, HAN, Sang Bok
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A heat treatment method of a substrate includes setting a temperature profile over the course of stabilization to a target temperature after the substrate is loaded as a reference, and controlling a temperature of the hot plate supporting the substrate on the basis of the reference.