PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONING A PATTERNING DEVICE

A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condit...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CEKLI, Hakki Ergün, VAN DAMME, Jean-Philippe Xavier, VAN HAREN, Richard Johannes Franciscu, NAKIBOGLU, Günes, VAN BOXTEL, Frank Johannes Jacobus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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