PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONING A PATTERNING DEVICE
A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condit...
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| creator | CEKLI, Hakki Ergün VAN DAMME, Jean-Philippe Xavier VAN HAREN, Richard Johannes Franciscu NAKIBOGLU, Günes VAN BOXTEL, Frank Johannes Jacobus |
| description | A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device. |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONING A PATTERNING DEVICE |
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