METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward abov...

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Hauptverfasser: SHIRAYONE, Shigeru, SUMIYA, Masahiro, IKENAGA, Kazuyuki, ISHIGURO, Masaki, TAMURA, Tomoyuki
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator SHIRAYONE, Shigeru
SUMIYA, Masahiro
IKENAGA, Kazuyuki
ISHIGURO, Masaki
TAMURA, Tomoyuki
description A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
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