SEMICONDUCTOR STRUCTURE WITH INTEGRATED PASSIVE STRUCTURES

A metal-oxide-semiconductor field-effect transistor (MOSFET) with integrated passive structures and methods of manufacturing the same is disclosed. The method includes forming a stacked structure in an active region and at least one shallow trench isolation (STI) structure adjacent to the stacked st...

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Bibliographische Detailangaben
Hauptverfasser: Mo, Renee T, Kumar, Arvind, Narasimha, Shreesh, Chou, Anthony I
Format: Patent
Sprache:eng
Schlagworte:
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