Methods for Increasing Hydrogen Trapping Vacancies in Materials

Methods and apparatus for increasing vacancies in a metallic structure are disclosed and for improving a hydrogen loading ratio in the metallic structure. The metallic structure comprises one or more transition metals or metal alloys. The metallic structure is prepared by forming a metal organic pre...

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Bibliographische Detailangaben
Hauptverfasser:	Greenwald, Michael Raymond, Burgess, Darren R, Barbee, Brent W
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL NON-METALLIC ELEMENTS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Methods and apparatus for increasing vacancies in a metallic structure are disclosed and for improving a hydrogen loading ratio in the metallic structure. The metallic structure comprises one or more transition metals or metal alloys. The metallic structure is prepared by forming a metal organic precursor and reducing the precursor to a metallic structure, in which a coordination number of the metal atoms is reduced and the vacancies in the metallic structure are increased.