POWER SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

The power semiconductor device includes: a first trench gate and a second trench gate in a stripe shape extending in one direction in parallel and spaced apart from each other in a substrate; a third trench gate in a ladder shape extending in a direction different from the one direction between the...

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Hauptverfasser: Park, Tae Young, Kim, Tae Youp, Kim, Young Joon, Jo, Seon-hyeong, Woo, Hyuk, LEE, Ju Hwan, Kang, Min Gi, Ha, Jeong Mok, Yun, Seong-hwan
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creator Park, Tae Young
Kim, Tae Youp
Kim, Young Joon
Jo, Seon-hyeong
Woo, Hyuk
LEE, Ju Hwan
Kang, Min Gi
Ha, Jeong Mok
Yun, Seong-hwan
description The power semiconductor device includes: a first trench gate and a second trench gate in a stripe shape extending in one direction in parallel and spaced apart from each other in a substrate; a third trench gate in a ladder shape extending in a direction different from the one direction between the first trench gate and the second trench gate in the substrate; a first conductive type body area each disposed between the first trench gate, the second trench gate and the third trench gate, respectively, in the substrate; a pair of first conductive type floating first areas surrounding each of bottom surfaces and at least one side of the first trench gate and the second trench gate in the substrate; and a first conductive type floating second area surrounding a bottom surface of the third trench gate in the substrate.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title POWER SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
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