LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE
A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object;...
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| creator | HOEFNAGELS, Pieter Jeroen Johan Emanuel BLOKS, Ruud Hendrikus Martinus Johannes BOMBEECK, John Maria MELMAN, Johannes Cornelis Paulus NEEFS, Patricius Jacobus KOX, Ronald Frank |
| description | A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object. |
| format | Patent |
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BLOKS, Ruud Hendrikus Martinus Johannes ; BOMBEECK, John Maria ; MELMAN, Johannes Cornelis Paulus ; NEEFS, Patricius Jacobus ; KOX, Ronald Frank</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2019361357A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HOEFNAGELS, Pieter Jeroen Johan Emanuel</creatorcontrib><creatorcontrib>BLOKS, Ruud Hendrikus Martinus Johannes</creatorcontrib><creatorcontrib>BOMBEECK, John Maria</creatorcontrib><creatorcontrib>MELMAN, Johannes Cornelis Paulus</creatorcontrib><creatorcontrib>NEEFS, Patricius Jacobus</creatorcontrib><creatorcontrib>KOX, Ronald Frank</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HOEFNAGELS, Pieter Jeroen Johan Emanuel</au><au>BLOKS, Ruud Hendrikus Martinus Johannes</au><au>BOMBEECK, John Maria</au><au>MELMAN, Johannes Cornelis Paulus</au><au>NEEFS, Patricius Jacobus</au><au>KOX, Ronald Frank</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE</title><date>2019-11-28</date><risdate>2019</risdate><abstract>A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE |
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