PATTERNING DEVICE COOLING APPARATUS
A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow...
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| creator | Baker, Lowell Lane BLOKS, Ruud Hendrikus Martinus Johannes SCHULTZ, Geoffrey Alan CEKLI, Hakki Ergun VAN DAMME, Jean-Philippe Xavier NAKÍBOGLU, Günes VAN BOKHOVEN, Laurentius Johannes Adrianus WARD, Christopher Charles VAN BOXTEL, Frank Johannes Jacobus |
| description | A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device. |
| format | Patent |
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SCHULTZ, Geoffrey Alan ; CEKLI, Hakki Ergun ; VAN DAMME, Jean-Philippe Xavier ; NAKÍBOGLU, Günes ; VAN BOKHOVEN, Laurentius Johannes Adrianus ; WARD, Christopher Charles ; VAN BOXTEL, Frank Johannes Jacobus</creatorcontrib><description>A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191114&DB=EPODOC&CC=US&NR=2019346777A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191114&DB=EPODOC&CC=US&NR=2019346777A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Baker, Lowell Lane</creatorcontrib><creatorcontrib>BLOKS, Ruud Hendrikus Martinus Johannes</creatorcontrib><creatorcontrib>SCHULTZ, Geoffrey Alan</creatorcontrib><creatorcontrib>CEKLI, Hakki Ergun</creatorcontrib><creatorcontrib>VAN DAMME, Jean-Philippe Xavier</creatorcontrib><creatorcontrib>NAKÍBOGLU, Günes</creatorcontrib><creatorcontrib>VAN BOKHOVEN, Laurentius Johannes Adrianus</creatorcontrib><creatorcontrib>WARD, Christopher Charles</creatorcontrib><creatorcontrib>VAN BOXTEL, Frank Johannes Jacobus</creatorcontrib><title>PATTERNING DEVICE COOLING APPARATUS</title><description>A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; 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a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PATTERNING DEVICE COOLING APPARATUS |
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