Deposition Selectivity Enhancement and Manufacturing Method Thereof

A method includes depositing an inhibitor layer on a first surface, depositing a film on a second surface by performing a first set of deposition cycles. Each deposition cycle includes adsorbing a first precursor over the second surface, performing a first purge process, adsorbing a second precursor...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lu, Bo-Cyuan, Chui, Chi On
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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