PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE

A plasma processing apparatus may include a support configured to receive a substrate, a gas distribution plate (GDP) including a plurality of nozzles facing the support, a main splitter configured to supply a process gas, and an additional splitter configured to supply an acceleration gas or a dece...

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Bibliographische Detailangaben
Hauptverfasser:	Park, Jin Young, Jeon, Sang Jean, Park, Ho Yong, Han, Je Woo, Sun, Jong Woo, Um, Jung Hwan, Park, Chan Hoon, Bang, Jin Young
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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