OPERATION METHOD OF VACUUM PROCESSING DEVICE

According to one embodiment, a vacuum processing device is provided which is capable of being controlled to create the most suitable gas flow under the situation where the device is placed by allowing a plurality of vacuum transfer chambers to communicate with each other via the intermediate chamber...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ISOMURA, Ryoichi, OGAWA, Keitarou, SAKURAGI, Takahiro
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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